Amorphous zirconium-nickel films formed by solid state reactions
Identifieur interne : 000951 ( Main/Exploration ); précédent : 000950; suivant : 000952Amorphous zirconium-nickel films formed by solid state reactions
Auteurs : B. M. Clemens [États-Unis] ; W. L. Johnson [États-Unis] ; R. B. Schwarz [États-Unis]Source :
- Journal of Non-Crystalline Solids [ 0022-3093 ] ; 1984.
Abstract
We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling and x-ray diffraction have been used to monitor the reaction. The thermodynamics of the process is explained in terms of a metastable free energy diagram which reflects the large negative heat of mixing between zirconium and nickel. The formation of an amorphous layer occurs via a diffusion limited reaction occurring at the zirconium-nickel interface.
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DOI: 10.1016/0022-3093(84)90643-4
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